MINIATURE INCREMENTAL LINEAR FEEDBACK

MICRON-P2 Miniature Incremental Optical Encoder

A compact HOPO incremental optical encoder for tight integration envelopes, with glass and stainless-scale configurations documented.

Brand HOPOSupplied by SENFU Technology
MICRON-P2 Miniature Incremental Optical Encoder product image
MICRON-P2SOURCE-BACKED RECORD
Scale Pitch20 µm
Standard Resolution Options5 / 10 / 20 / 50 / 100 nm
Readhead Dimensions21 × 10 × 5 mm
Installation Gap0.6 ±0.1 mm

PRODUCT OVERVIEW

Selection starts with the operating requirement.

MICRON-P2 can be evaluated for compact precision stages. Public selection data uses source-consistent standard resolutions only; the disputed 1 nm marketing statement is blocked.

Open technical itemThe 1 nm / 5 nm / 10 nm source conflict must be resolved before broader resolution claims are published.

ENGINEERING VALUE

What this platform brings to the design.

01

Miniature package

A 21 × 10 × 5 mm readhead supports compact machine layouts.

02

Defined installation gap

Source drawings provide a nominal sensing gap for mechanical integration.

03

Material options

Glass and stainless scale formats support different travel and mounting strategies.

KEY SPECIFICATIONS

Source-backed technical data.

These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.

Scale Pitch
20 µm
Standard Resolution Options
5 / 10 / 20 / 50 / 100 nm
Readhead Dimensions
21 × 10 × 5 mm
Installation Gap
0.6 ±0.1 mm
Output Signals
A+/A- / B+/B- / Z+/Z-
Supply Voltage
5 V ±5%
Protection Rating
IP40
Scale Materials
glass / stainless steel option stated

Source records: SRC-HOPO-MP2-DAT-001 · SRC-HOPO-MP2-DWG-001 · SRC-HOPO-MP2-CAD-001 · SRC-HOPO-CAT-2025-001

SUITABLE APPLICATIONS

Evaluate fit in context.

↗Compact stages
↗Microscope platforms
↗Laboratory automation
↗OEM motion modules

TECHNICAL EVALUATION

Confirm the configuration against your machine or process.

Send the motion profile, installation envelope, environment or lithography process target. We will turn it into a structured selection review.

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