Coupon design
Cover resolution, density, fields, marks, charge control and representative area.
PROCUREMENT / NANOFABRICATION
Create an EBL acceptance plan covering resolution, write field, stitching, overlay, charging, vacuum, throughput and repeatability before commissioning.
Published

DIRECT ANSWER
An EBL acceptance test plan should use defined coupons and measured evidence for the process the facility will run. Test isolated and dense resolution, linewidth and roughness, write-field calibration, stitching, overlay, charging control, vacuum recovery, stage behavior, throughput and repeatability. State beam energy/current, resist, dose, development, substrate, metrology, software revision and pass/fail rules for every result.
The ZEL304G documentation lists image-resolution, beam, write-field, field-calibration, stitching, overlay, multilayer and optional proximity-effect functions. Acceptance should verify the selected configuration under the buyer's process, not repeat a generic datasheet number. Preserve raw job files, SEM or metrology images, calibration records, environmental logs and exception decisions before the tool is handed to operations.
ENGINEERING CONTEXT
EBL commissioning can produce an excellent single feature while leaving field distortion, charging, stage drift or write-time risk unresolved. A written acceptance plan protects the facility from accepting a system that is difficult to reproduce in daily nanofabrication.
Discuss your requirement ↗CRITICAL REQUIREMENTS
Cover resolution, density, fields, marks, charge control and representative area.
Freeze substrate, resist, voltage, current, dose, development, vacuum and calibration.
Define SEM/AFM/optical methods, scale, sites, uncertainty and repeat count.
Record raw data, pass/fail, open items, training, service and re-test ownership.
BUYER MATRIX
Give every shortlisted supplier the same process definition and request configuration-specific proof.
| Test | Required record | Why it matters |
|---|---|---|
| Resolution | Isolated/dense features with process conditions | Separates column image capability from usable CD |
| Field | Calibration map and field size | Controls distortion and stitching |
| Overlay | Multilayer marks and coordinate residuals | Validates device alignment |
| Charging | Substrate/discharge layer and failure log | Protects feature placement |
| Throughput | Reference job time and settings | Budgets facility capacity |
| Repeatability | Runs, operators and thermal state | Shows daily stability |
Define what the facility expects to write: critical dimension, pitch, pattern area, layer count, overlay, substrate, resist, workload, vacuum and metrology. Separate platform acceptance from process-development targets. A supplier may need to optimize a new resist, but the handover decision should still have a clear minimum evidence package.
Identify the exact ZEL configuration, source, voltage, current, write-field list, stage, generator, software and optional functions. The same model name can cover different settings, so the plan should carry the configuration record into every coupon and raw file.
Use isolated and dense lines, equal line/space, a large-area pattern, field-crossing structures, alignment marks, charging test areas and a representative device fragment. Include a layout that stresses the expected write field and stage travel. The coupon should be small enough to repeat but rich enough to reveal field, process and metrology errors.
Record layout revision, file conversion, orientation and layer names. If a discharge layer or conductive substrate is required, include it in the coupon and in the process record. A coupon that omits charging or field stitching cannot accept those functions.
State acceleration voltage, beam current, aperture, spot or image-resolution condition, dose, step or dwell, resist, thickness, bake, developer and substrate. Request SEM images with scale and process conditions. A quoted linewidth without those conditions is not a reproducible acceptance result.
Use the facility's intended resist or label an alternative clearly. Higher voltage, current and dose trade resolution, damage and write time; the plan should test the operating point the lab will actually use rather than the supplier's best demonstration setting.
Expose marks across a single field and across field boundaries. Measure field distortion, stitch residual and overlay with the agreed metrology. Repeat in multiple locations and, for multilayer work, after the second exposure. Record calibration file, stage coordinate, mark design and software revision.
The ZEL304G documentation lists a maximum field and field-calibration, stitching and overlay functions; acceptance should show the result under the buyer's pattern class and substrate. A best-case field image does not close a large-area or multilayer requirement.

Use the actual substrate and discharge-layer plan. DTU Nanolab guidance emphasizes conductive grounding or a discharge layer for insulating substrates; include that layer, removal step and process impact in the acceptance record. Monitor beam stability, pattern placement and defects when the coupon charges or when the process changes.
Record pump-down, base pressure, outgassing or conditioning, stage temperature and warm-up. Vacuum recovery and thermal state affect both reproducibility and throughput. A facility should know when the tool is ready for a production-representative job, not only when the chamber door closes.
Define a reference job with pattern area, density, dose, beam current, field, correction, stage moves and number of layers. Time file preparation, loading, alignment, exposure, unload and inspection separately. A sparse coupon can hide the cost of a dense device or proximity-effect correction.
Compare the result with the facility's expected workload and schedule. Record whether the supplier used a production-representative generator and correction setting. Throughput is an acceptance item when tool time is a capacity constraint, even if resolution is the primary technical goal.
Repeat the coupon after reload, warm-up, a second operator and a controlled restart. Test alarms, beam blanking, stage stop, file resume and safe recovery. Keep failed results; they reveal whether the process or tool is robust. Define how a failed measurement is repeated and who owns the corrective action.
Handover should include calibration backup, recipe, job files, maintenance schedule, training record and service contacts. Any software or hardware change after acceptance should trigger a defined re-test rather than an informal sign-off.
The final record should include scope, configuration, coupons, process conditions, raw files, measurement tables, uncertainty, pass/fail, open items, exceptions, training and requalification triggers. Distinguish guaranteed limits from typical or process-dependent results and keep the source documents with the tool file.
SENFU can review an EBL acceptance plan against the documented ZEL304G functions and the facility's device stack. A complete handover makes the first production job a controlled continuation of the demonstration rather than a new experiment.
The acceptance record should say where job files, recipes, calibration backups, SEM images, metrology tables, software versions and maintenance logs are stored and who may change them. Keep a configuration snapshot with the accepted source, generator, stage, write-field settings and optional functions. If the facility cannot reproduce a result from the archived data, the result is difficult to defend during a service call or a process transfer.
Set requalification triggers before handover: source or column service, stage or chuck change, software update, calibration file replacement, vacuum intervention, new resist or substrate class, or a major recipe change. A focused re-test can be proportional to the change, but it should cover the affected risk and compare with the original control coupon. This gives procurement a lifecycle plan and lets the nanofabrication team distinguish tool drift from process development.
Name the acceptance owner for each risk and make the open-item list visible. Resolution, stitching, charging, vacuum, throughput and training may be owned by different teams, but the handover should have one decision record that links their evidence. If a result is conditional on a future resist, stage setting or software feature, label it as development work and schedule the follow-up test. That clarity prevents a commissioning demonstration from being misread as a universal performance guarantee.
Keep the acceptance coupon and its measurement recipe available for a later comparison. A repeat run after maintenance should use the same field-crossing marks, charging structure, workload and metrology sites unless the change itself requires a new design. The comparison can then show tool drift, process drift or a measurement change without reopening the entire purchase debate.
CONCLUSION
An EBL acceptance plan must prove usable resolution, field calibration, stitching, overlay, charging control, vacuum behavior, throughput and repeatability under the buyer's process. Keep raw data and a clear pass/fail rule.
SENFU can help align the ZEL304G configuration, coupons, metrology and handover record with the nanofabrication workload before the system is released to operations.
SOLUTION ROUTES
EVIDENCE CHECKLIST
FAQ
No. Use a coupon that tests resolution, density, field, overlay, charging and repeatability with full process conditions.
Image resolution describes the column under stated conditions; process linewidth also depends on resist, dose, development, pattern density, substrate and metrology.
Yes, when insulating substrates or dielectric films are part of the workload. Include the conductive or discharge-layer process and its removal.
Use a reference workload with area, density, dose, current, fields, correction and layers and separate setup, exposure and inspection time.
Send device stack, critical features, pattern area, field, alignment, substrate, resist, workload, metrology and acceptance rules.
AUTHORITATIVE SOURCES
TECHNICAL REVIEW
Send the application, critical parameters and any drawing or process information available.
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